Pattern forming apparatus
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United States of America Patent
Stats
-
Nov 6, 1984
Grant Date -
N/A
app pub date -
Mar 15, 1982
filing date -
Mar 18, 1981
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
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Cited Art Landscape
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