Ultrathin film, process for production thereof, and use thereof for concentrating a specified gas in a gaseous mixture

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United States of America Patent

PATENT NO 4493714
SERIAL NO

06491536

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Abstract

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An ultrathin film composed substantially of silicon-containing polyurea comprising polyaddition bonded units derived from (A) at least one polyamine selected from the group consisting of silicon-containing polyamines and hydrocarbon-type polyamines, each of said polyamines containing at least two primary or secondary amino groups in the molecule, and (B) at least one polyisocyanate compound selected from the group consisting of silicon-containing polyisocyanates and hydrocarbon-type polyisocyanates, each of said polyisocyanates having at least two isocyanate groups in the molecular chains; provided that when the polyisocyanate compound is the hydrocarbon-type polyisocyanate alone, at least one of the selected polyamines is a silicon-containing polyamine containing at least one terminal amino group in the molecule. A composite structure composed of a microporous supporting film and the ultrathin film supported thereon is useful for the production of a gaseous mixture containing a specified gas in a high concentration from a mixture of two or more gases including said specified gas, and is prepared by subjecting the polyamine and the polyisocyante compound to interfacial polyaddition reaction on a microporous supporting film to form an ultrathin film composed substantially of a silicon-containing polyurea on the microporous supporting film.

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Patent Owner(s)

Patent OwnerAddress
TEIJIN LIMITED2-4 NAKANOSHIMA 3-CHOME KITA-KU OSAKA-SHI OSAKA 5300005 ?5300005

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Eiichi Iwakuni, JP 8 208
Mori, Koh Iwakuni, JP 2 153
Ueda, Fumio Iwakuni, JP 17 421
Yamada, Takeyoshi Iwakuni, JP 40 671

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