Etching techniques

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United States of America Patent

PATENT NO 4498953
SERIAL NO

06517754

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A highly selective--greater than 100 to 1--etch for silicon, tantalum, tantalum silicide and tantalum nitride is achieved by using polyatomic halogen fluorides. The selectivity is achievable without employing plasmas or wet etching.

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Patent Owner(s)

  • AT&T BELL LABORATORIES;BELL TELEPHONE LABORATORIES, INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cook, Joel M Union Township, Hunterdon County, NJ 16 741
Donnelly, Vincent M Berkeley Heights, NJ 14 910
Flamm, Daniel L Chatham Township, Morris County, NJ 19 765
Ibbotson, Dale E Westfield, NJ 7 506
Mucha, John A Madison, NJ 4 186

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