Film depositing apparatus and a film depositing method

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United States of America Patent

PATENT NO 4501766
SERIAL NO

06457231

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A film depositing apparatus forms a film with a given thickness on each of a plurality of bases. The apparatus is provided with a casing removably mounted on a base section to form a film depositing chamber whose interior is isolated from the outside space; transfer mechanism for transferring the plurality of bases in one direction inside the film depositing chamber; gas supplying mechanism for feeding material gas into the casing, the gas supplying mechanism including injecting portions arranged along said one direction in the film depositing chamber to inject the material gas in the casing into the film depositing chamber along said one direction; and electric discharge mechanism for activating the material gas injected into the film depositing chamber by the injecting portions.

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Patent Owner(s)

Patent OwnerAddress
TOKYO SHIBAURA DENKI KABUSHIKI KAISHA A CORP OF JAPAN72 HORIKAWA-CHO SAIWAI-KU KAWASAKI-SHI

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suzuki, Katsumi Tokyo, JP 208 2211
Yoshizawa, Shuji Tokyo, JP 26 219

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