Method of catalytic etching
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United States of America Patent
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-
Mar 19, 1985
Grant Date -
N/A
app pub date -
May 10, 1983
filing date -
May 10, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Catalytic etching is carried out by placing a pattern of a catalyst on a surface to be selectively etched and treating the imaged surface with an activated fluid which consumes the material being etched. In one embodiment a surface such as a chalcogenide is provided with a silver or other metal pattern corresponding to a semiconductor pattern and the chalcogenide is etched with an oxygen containing plasma reactive with the chalcogenide, the reaction being increased by the silver to provide a positive resist.
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