Substrate having high absorptance and emittance black electroless nickel coating and a process for producing the same
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United States of America Patent
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-
Apr 16, 1985
Grant Date -
N/A
app pub date -
Oct 31, 1983
filing date -
Oct 31, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A substrate having high absorptance and emittance is produced by roughening the surface of the substrate, immersing the substrate in a first electroless plating bath having a low phosphorus to nickel concentration, then immersing the substrate in a second electroless plating bath having a phosphorus to nickel concentration higher than that of said first electroless plating bath. Thereafter, the resulting electroless nickel-phosphorus alloy coated substrate is immersed in an aqueous acidic etchant bath containing sulfuric acid, nitric acid and divalent nickel to develop a highly blackened surface on said substrate.
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