Wafer processing machine
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United States of America Patent
Stats
-
Jun 18, 1985
Grant Date -
N/A
app pub date -
Dec 22, 1983
filing date -
Dec 22, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A sputter coating machine includes a rectilinearly translatable load-lock door closing off one end of an evacuable chamber. Wafers to be coated are loaded and unloaded by an elevator blade onto a chuck carried from the inside surface of the door. A clamping ring clamps the wafer to the chuck and advances the wafer through the open throat of a gate-valve portion of the chamber into position opposite a magnetron sputter gun carried from a second door closing off the other end of the chamber. The second door is movable away from the chamber on guide rails and pivotable about an axis for ease of maintenance.
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