Method for epitaxially growing Ge.sub.x Si.sub.1-x layers on Si utilizing molecular beam epitaxy

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United States of America Patent

PATENT NO 4529455
SERIAL NO

06546736

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Abstract

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A molecular beam epitaxy method of growing Ge.sub.x Si.sub.1-x films on silicon substrate is described.

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Patent Owner(s)

Patent OwnerAddress
WESTERN ELECTRIC COMPANY INCORPORATED222 BROADWAY A CORP OF NY NEW YORK NY 10038

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bean, John C New Providence, NJ 16 410
Feldman, Leonard C Berkeley Heights, NJ 18 420
Fiory, Anthony T Summit, NJ 8 183

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