Method for providing a coating layer of silicon carbide on the surface of a substrate
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United States of America Patent
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Jul 30, 1985
Grant Date -
N/A
app pub date -
Dec 22, 1983
filing date -
Dec 29, 1982
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention provides a novel method for providing the surface of various kinds of substrate articles, e.g. sapphire, quartz, alumina, metals, glass, plastics and the like with a coating layer of an amorphous silicon carbide of the formula Si.sub.x C.sub.1-x, in which x is a positive number of 0.2 to 0.9, by exposing the surface of the substrate article to an atmosphere of plasma generated in a gaseous atmosphere of an organosilicon compound having no halogen or oxygen atom directly bonded to the silicon atom, such as hexamethyl disilane, optionally admixed with a vapor or gas of a hydrocarbon compound, e.g. methane, benzene and the like.
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