Photomask inspection apparatus and method using corner comparator defect detection algorithm
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United States of America Patent
Stats
-
Jul 30, 1985
Grant Date -
N/A
app pub date -
May 12, 1983
filing date -
May 12, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Defect detection apparatus including a mechanical and optical system for scanning duplicate areas of a photomask to be inspected, electronic means for converting the optically scanned information to digitized form, memory for storing such information, and means for comparing information obtained from one inspected area to the other inspected area to determine differences therebetween, such differences being classified as defects. The detection is accomplished using a vector gradient within a matrix technique to develop candidate and cancellor information which is then logically manipulated to qualify the data obtained from each pixel matrix and then, after qualification, is used to determine whether or not a defect has been detected. The subject invention has particular application to the detection of defects occurring at pattern corners within the inspected photomask and is specifically directed to overcoming difficulties previously encountered in detecting such defects.
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