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United States of America Patent
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Nov 12, 1985
Grant Date -
N/A
app pub date -
Apr 25, 1984
filing date -
Apr 25, 1984
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A thin-film disc fabrication method and structure contemplates a sputtered undercoat. An aluminum base is subjected to a fine polishing step, and a relatively thin undercoat is deposited by sputtering. The preferred undercoat is a 0.3-3 micron layer of nickel-vanadium alloy (on the order of 7% vanadium). The preferred recording layer is a sputtered composite structure comprising a layer of chromium and an overlying layer of a cobalt-chromium alloy. Modulation effects can be substantially eliminated by heating the aluminum base prior to sputtering the nickel-vanadium undercoat, and by oxidizing the undercoat prior to deposition of the overlying layers.
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