Method of fabricating solar cells
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United States of America Patent
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-
Dec 10, 1985
Issued Date -
N/A
app pub date -
Dec 13, 1984
filing date -
Oct 31, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A solar cell fabrication procedure is described in which a hydrogen ion passivation step is used to form, inter alia, an altered silicon substrate surface layer to which immersion plated nickel will not readily adhere. The altered surface layer is formed by shadow casting an ion beam in a pattern corresponding to the desired front surface interelectrode configuration.
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