Troide plasma reactor with magnetic enhancement
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United States of America Patent
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Feb 25, 1986
Grant Date -
N/A
app pub date -
Dec 26, 1984
filing date -
Dec 26, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A triode apparatus with magnetic enhancement for dry processing semiconductor wafers and the like. A conductive substantially cylindrical chamber contains a cathode that is connected to a first source of AC power. A wafer stage mounted on the inside of the chamber wall is connected to a second source of AC power. The chamber has means for connection to a reference voltage potential. Means for generating a magnetic field perpendicular to the electric field generated between the chamber walls and the cathode is also provided.
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