Titanium disulfide thin film and process for fabricating the same
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United States of America Patent
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Feb 25, 1986
Issued Date -
N/A
app pub date -
Feb 19, 1985
filing date -
Sep 13, 1982
priority date (Note) -
Expired
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Abstract
The present invention relates to a titanium disulfide film fabricated on a substrate, where crystallites of titanium disulfide is oriented at an angle of their c-axis to the substrate surface of not more than 45.degree., and to a process for fabricating the film, where the film is prepared by chemical vapor deposition from TiCl.sub.4 and H.sub.2 S as source gases under an inner pressure of reaction tube of 30 kPa or less.
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