Device for projection copying of masks onto a workpiece
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United States of America Patent
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-
Jun 3, 1986
Grant Date -
N/A
app pub date -
Jan 23, 1985
filing date -
Jan 23, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
For a device for projection copying of masks on a semiconductor substrate for the manufacture of integrated circuits, it is intended that the copying of an adjusting mark of the workpiece onto a sensor takes place by means of the projection lens, whereby the directly reflected beams of the light which makes visible the adjusting mark are masked out by a mirror, and the position-sensitive sensor is fastened at the underside of the frame carrying the mask.
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Cited Art Landscape
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