High intensity microfocus X-ray source for industrial computerized tomography and digital fluoroscopy
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 19, 1986
Grant Date -
N/A
app pub date -
Jun 25, 1984
filing date -
Jun 25, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A high intensity microfocus x-ray source for the inspection of superalloy objects and the like operates at a voltage of the order of 400-500 kV with an electron beam focal spot size of the order of 2-10 mils and at power levels of tens to hundreds of kilowatts and affords a brightness improvement of at least three thousand over conventional x-ray sources.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully