Importance

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Abstract

Waste gases and other noxious substances which are formed in connection with chemical processes and the manufacture of devices such as semiconductors and covalent hydrides and element organic compounds, etc. are treated so as to remove the noxious components. The inventive method removes noxious components from substances including waste gases one group or part of said noxious components containing covalent hydrides and element-organic compounds and another group or part of said noxious components containing halogens, halogens in aqueous solutions, and acid compounds such as hydrogen halides and pseudohalides; which removal comprising: oxidizing noxious components of said one group or part in a first stage and a spontaneous reaction by means of one of: a solution of bromic acid, a solution of iodic acid, a solution of bromate salt, a solution of iodate salt, an aqueous solution of bromine, an aqueous solution of iodine, an organic solution of bromine, and an organic solution of iodine, so that they are absorbed by complete conversion into water-soluble acids and in which a bromine or iodine is formed as a free halogen, and in a second stage converting and dissolving in basic solutions the bromine and/or iodine which is formed in the first stage into a corresponding bromide or iodide or bromate or iodate as well as completely neutralizing the noxious components of said other group or part which have passed the first stage.

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First Claim