Materials which exhibit a surface active effect with vacuum baked photoresists and method of using the same
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United States of America Patent
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Sep 23, 1986
Grant Date -
N/A
app pub date -
Nov 16, 1984
filing date -
Nov 16, 1984
priority date (Note) -
Expired
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Abstract
A process for manufacturing a thin film magnetic head, the improvement wherein a metal, alloy or mixture thereof which improves the surface characteristics of a vacuum baked photoresist is deposited on the vacuum baked photoresist to thereby improve adhesion of a subsequently deposited layer.
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