Plasma CVD apparatus for making photoreceptor drum
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United States of America Patent
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Oct 7, 1986
Grant Date -
N/A
app pub date -
Mar 7, 1985
filing date -
Mar 13, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plasma CVD (chemical vapor deposition) apparatus of the capacitance coupling type for effecting the chemical vapor deposition on a drum which includes an air tight chamber made of an electrically conductive material, a support provided in the chamber for supporting the drum inside the chamber in an electrically insulated relationship with the chamber, and an RF power source for supplying RF power to the drum. The chamber is grounded and, therefore, the plasma is generated between the drum and inside wall of the chamber. The apparatus is provided with means for providing a smooth surface on the drum. The drum can be used as a photoreceptor for use in an electrophotographic copying machine.
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