Microlithographic system
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United States of America Patent
Stats
-
Oct 14, 1986
Grant Date -
N/A
app pub date -
Jul 19, 1984
filing date -
Jul 19, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In the microlithographic system disclosed herein, the spaces between elements in a projection lens are filled with flowing helium gas which substantially reduces the refraction errors caused by barometric changes in the atmosphere, even though the portions of the optical path outside the lens are exposed to the atmosphere.
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Family
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Cited Art Landscape
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