Device for the projection copying of masks onto a workpiece
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United States of America Patent
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-
Nov 11, 1986
Grant Date -
N/A
app pub date -
Aug 10, 1984
filing date -
Aug 12, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to make variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the adjustment light is eliminated by an achromatization device which covers only a part of the total picture field which contains the adjustment marks.
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Cited Art Landscape
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