
US Patent No: 4,622,058
Number of patents in Portfolio can not be more than 2000
Formation of a multi-layer glass-metallized structure formed on and interconnected to multi-layered-metallized ceramic substrate
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Nov 11, 1986
Issued date -
Mar 25, 1986
filing date -
06/844,260
serial no -
Expired
status
Importance
Abstract
In the fabrication of an interconnection package for a plurality of semiconductors or integrated circuit chips wherein a multi-layered glass or glass-ceramic superstructure with a multi-layered distribution of planar conductors is formed by a process forming vertical conductive interconnection or studs between planar conductor layers, by pre-forming a via configuration in each glass or glass-ceramic layer at the interconnection points followed by depositing the conductive studs therein. The via configuration is formed by defining a desired pattern of vias, and ablating the vias through the top of and through the glass or glass-ceramic layer, using an ultraviolet laser. The vias may be stepped-shoulder or counter-bored by using a two mask operation.
First Claim
Related Publications
International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 4,439,270 Process for the controlled etching of tapered vias in borosilicate glass dielectrics | 40 | 1983 | |
| 4,478,677 Laser induced dry etching of vias in glass with non-contact masking | 53 | 1983 | |
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| 4,508,749 Patterning of polyimide films with ultraviolet light | 105 | 1983 | |