Apparatus for coating materials by cathode sputtering
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United States of America Patent
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-
Nov 11, 1986
Grant Date -
N/A
app pub date -
Apr 18, 1985
filing date -
Apr 19, 1984
priority date (Note) -
Expired
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Abstract
Arrangements for coating substrates, comprising a hollow cathode around the substrate with at least two sputtering zones with the proportion between the sputtering performances in the zone being adjustable, to obtain a more uniform coating also of lateral surfaces formed by steps on the substrate.
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