Process for forming a synthetic resin film on a substrate and apparatus therefor
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United States of America Patent
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Nov 25, 1986
Issued Date -
N/A
app pub date -
Mar 21, 1985
filing date -
Mar 21, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for forming a covering film of a synthetic resin on a substrate comprising, under vacuum conditions, evaporating at least two monomers to cause vapors of said at least two monomers to adhere to the substrate, and polymerizing said at least two monomers on said substrate. An apparatus for carrying out the process includes a vacuum chamber and provided therein, means for holding and evaporating at least two raw material monomers for the synthetic resin, means for holding and heating the substrate and a shutter for separating the means for holding the monomers and the means for holding the substrate. The means for holding and heating the monomers can be provided outside the vacuum chamber and a window can be provided in a wall of the chamber to allow the substrate to be irradiated from a light source located outside the chamber.
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