Pattern checking apparatus
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United States of America Patent
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-
Dec 9, 1986
Grant Date -
N/A
app pub date -
Feb 27, 1984
filing date -
Feb 28, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
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