Automatic photomask inspection system having image enhancement means
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United States of America Patent
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-
Dec 30, 1986
Grant Date -
N/A
app pub date -
Jun 28, 1984
filing date -
Jun 28, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Optical inspection apparatus for detecting defects in a visually perceptible pattern including image acquistion means for inspecting the pattern on a pixel-by-pixel basis, developing digital data signals corresponding to each pixel and feeding the signals so developed to an imaging enhancement means. The imaging enhancement means compensates for equipment related degradations in the images and converts the digital data signal value corresponding to each pixel into a corrected signal value by operating on the digital data signal with a two dimensional finite impulse response filter. The corrected signal values of the image enhancement means are received by a defect detection means which evaluates the signal values for defects in the pattern. Any defects so determined are recorded and/or displayed on data recording means.
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Cited Art Landscape
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