Polymeric thin film, process for producing the same and products containing said thin film
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United States of America Patent
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Jan 13, 1987
Grant Date -
N/A
app pub date -
Sep 28, 1984
filing date -
Sep 28, 1984
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention concerns a process for producing a novel polymeric thin film having high density, high hardness and high toughness on the surface of a substrate by plasma polymerization. This process comprises providing a gas containing at least one compound selected from halogenated alkanes, alkanes, hydrogen and halogens in specific combinations for plasma polymerization, the atomic ratio of halogen/hydrogen in the aforesaid gas being 0.1 to 5 and the electron temperature of the plasma in the reaction zone being 6,000.degree. K. or higher and lower than 30,000.degree. K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust proofing, scratch proofing, providing gas barrier, etc. In particular, it is suitable as the protective film of magnetic recording media.
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