Exposure apparatus for printing system
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United States of America Patent
Stats
-
Jan 27, 1987
Grant Date -
N/A
app pub date -
Dec 10, 1985
filing date -
Dec 10, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Apparatus is described for exposing a layer of photosensitive material to form an image thereon, by passing the photosensitive layer under a row of closely spaced light shutter apertures which are selectively opened and closed. The total light falling on each pixel area at the photosensitive layer is increased by using apertures which are long and thin, and concentrating the light passing therethrough onto a pixel at the photosensitive layer. Two rows of staggered apertures are used. The photosensitive layer is on a transparent substrate, and a reflector lies on a side of the substrate opposite the light apertures, so light passing through the photosensitive layer and substrate is reflected back through the layer to pass twice therethrough. The entire sheet is pre-exposed to light of a level less than a threshold, with the light subsequently passing through each light aperture being sufficient to raise the total exposure beyond the threshold.
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Patent Owner(s)
| Patent Owner | Address | |
|---|---|---|
| QUME CORPORATION A CORP OF CA | 2350 QUME DRIVE SAN JOSE CA |
International Classification(s)
Inventor(s)
| Inventor Name | Address | # of filed Patents | Total Citations |
|---|---|---|---|
| Beery, Jack | Fremont, CA | 34 | 802 |
| Broome, Barry G | Glendora, CA | 36 | 959 |
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| Fee | Large entity fee | small entity fee | micro entity fee |
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| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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