Exposure apparatus for printing system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4639127
SERIAL NO

06807417

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Apparatus is described for exposing a layer of photosensitive material to form an image thereon, by passing the photosensitive layer under a row of closely spaced light shutter apertures which are selectively opened and closed. The total light falling on each pixel area at the photosensitive layer is increased by using apertures which are long and thin, and concentrating the light passing therethrough onto a pixel at the photosensitive layer. Two rows of staggered apertures are used. The photosensitive layer is on a transparent substrate, and a reflector lies on a side of the substrate opposite the light apertures, so light passing through the photosensitive layer and substrate is reflected back through the layer to pass twice therethrough. The entire sheet is pre-exposed to light of a level less than a threshold, with the light subsequently passing through each light aperture being sufficient to raise the total exposure beyond the threshold.

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Patent Owner(s)

Patent OwnerAddress
QUME CORPORATION A CORP OF CA2350 QUME DRIVE SAN JOSE CA

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beery, Jack Fremont, CA 34 802
Broome, Barry G Glendora, CA 36 959

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