Inspection method and apparatus for a mask pattern used in semiconductor device fabrication
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United States of America Patent
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-
Feb 3, 1987
Grant Date -
N/A
app pub date -
Sep 10, 1984
filing date -
Sep 16, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An inspection method and apparatus for a mask pattern such as a reticle pattern used in the fabrication of a semiconductor device is disclosed. The mask pattern is inspected by an imaging sensor mounted on a stage on which a fabricated object is also mounted. The imaging sensor converts an optical image of the mask pattern which is intended to be exposed on the object to a video signal and it is inspected by comparing it with another video signal provided from data for designing the mask pattern. This inspection is made before the process of exposing the mask pattern on the fabricated object in order to avoid a waste of time in the semiconductor pattern process.
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