Ultrathin film, process for production thereof, and use thereof for concentrating a specific gas from a gas mixture
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 17, 1987
Grant Date -
N/A
app pub date -
Jun 19, 1985
filing date -
Jun 20, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An ultrathin film composed substantially of a silicon-containing polymer comprising bonded units derived from (A) at least one polyamine selected from the group consisting of silicon-containing polyamines containing in the molecule at least two primary and/or secondary amino groups not directly bonded to the silicon atom, (B) at least one compound selected from the group consisting of polysiloxane-type compounds having at least two acidic hydroxyl groups in the molecule, and (C) at least one polyisocyanate selected from the group consisting of polyisocyanates having at least two isocyanate groups in the molecule. The ultrathin film on the supporting microporous substrate is useful for production of a gaseous mixture containing a specific gas such as O.sub.2 in a higher concentration from a gaseous mixture of at least two gases such as air.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully