Plasma CVD apparatus and method for forming a diamond like carbon film
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United States of America Patent
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Feb 24, 1987
Grant Date -
N/A
app pub date -
Nov 29, 1985
filing date -
Aug 31, 1984
priority date (Note) -
Expired
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Abstract
A plasma CVD apparatus comprises a first vacuum enclosure with a plasma generating means, an accelerating means for accelerating ions in a plasma toward a substrate and a second vacuum enclosure connected to the first vacuum enclosure, so that the plasma gas flows into the second vacuum enclosure and forms a film of uniform and superior quality at high speed.
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