Method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 5, 1987
Grant Date -
N/A
app pub date -
Dec 20, 1985
filing date -
Dec 20, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Described is a method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers onto which fields the pattern of the photomask is to be imaged for projection printing, each of said number of wafers carrying an identical array of fields produced in at least one previous printing process. For this purpose it is possible to choose one out of the identical batch of wafers, measure the rotational adjustment necessary to bring each field into the correct direction in the horizontal plane and to use the measured value for an automatic rotational adjustment of all other wafers of the batch.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully