Method and apparatus for monitoring laser processes
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United States of America Patent
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-
May 5, 1987
Grant Date -
N/A
app pub date -
Nov 26, 1985
filing date -
Nov 26, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for monitoring and verifying laser processes detects infrared radiation along a laser process path at a point apart from and behind the point where the laser processing is actually occuring at a particular time. A window value of temperatures (proportional to detected infrared radiation) is determined and utilized to monitor the process. If the temperature profile corresponding to the detected infrared radiation is not within the window value a signal is generated which can trigger a different number of events.
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