Microlithographic reticle positioning system
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United States of America Patent
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-
May 26, 1987
Grant Date -
N/A
app pub date -
Nov 29, 1985
filing date -
Nov 29, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In the reticle positioning system disclosed herein, a unitary structure is machined to form both a frame for holding a reticle and a compound linkage permitting lateral and rotational movement of the frame within its own plane under the control of three servo motors generating controllable displacements.
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