Method for patterning transparent layers on a transparent substrate
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United States of America Patent
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Jun 2, 1987
Grant Date -
N/A
app pub date -
Dec 23, 1985
filing date -
Dec 23, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An optically transparent and electrically conductive film is patterned on aubstrate, for instance in an electro-optical display device such as an electroluminescent device having a patterned transparent electrode layer, by a process utilizing a double masking structure that provides for more positive delineation of thin film device patterns. In this process, an indium tin oxide layer is formed between a metallic pattern on a glass substrate and a photoresist mask. The indium tin oxide layer has a metal lift-off mask under those areas that are to be removed and a photoresist protective mask over those areas that are to remain. The double masking will also provide greater protection to the electrode areas during the critical etching steps in developing an electroluminescent display.
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