Method for electroless and vapor deposition of thin films of three tin sulfide phases on conductive and nonconductive substrates
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United States of America Patent
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Jul 21, 1987
Grant Date -
N/A
app pub date -
May 5, 1986
filing date -
May 5, 1986
priority date (Note) -
Expired
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Abstract
The present invention relates to a method for electroless and vapor deposition of thin films of one, two and/or three semiconducting tin sulfide phases (SnS, Sn.sub.2 S.sub.3, and/or SnS.sub.2) by below-solution electroless plating and/or above-solution self-induced chemical vapor deposition onto both nonconductive and conductive substrates from a chemical bath containing an organic acid, Sn(II) salt, elemental yellow sulfur and water.
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