Polishing method and apparatus
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United States of America Patent
Stats
-
Aug 25, 1987
Grant Date -
N/A
app pub date -
Jan 3, 1986
filing date -
Jan 3, 1986
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Method and apparatus for polishing an article are provided. The method features the step of contacting the article in an area to be polished with at least one polyethylene filament. The polishing apparatus comprises at least one polyethylene filament, and means for rotating the filament about a central axis for contact with the surface to be polished. The polyethylene filament of choice is characterized by a tenacity and an elongation such that the product of the tenacity and the square root of the elongation (toughness paramenter) ranges from 20 to 60 units. With use of such a filament, deflashing of an article to be deflashed can be accomplished simultaneously with the polishing of the article.
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