X-ray lithography system
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United States of America Patent
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-
Sep 8, 1987
Grant Date -
N/A
app pub date -
Nov 8, 1984
filing date -
Nov 8, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask used in the lithographic process to displace the particles away from the mask. The sheet of gas may also be used to maintain a pressure differential across an opening in the evacuated chamber through which the X-rays pass towards the target. In addition, the gas sheet may be used to cool the X-ray mask by placing the mask close to the sheet but at a sufficient distance so that the sheet does not interfere with the mask.
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