Gas-treating device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 20, 1987
Grant Date -
N/A
app pub date -
Feb 13, 1986
filing date -
Feb 20, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In a gas treating device liquid is pressurized in a liquid chamber and is fed from this chamber into ejectors which open directly into venturi fittings which are surrounded by a gas chamber. Gas enters through an inlet into this gas chamber. A gas-liquid mixture enters from the venturi fittings into a tank, where the gas is separated from the liquid. Liquid from the tank is fed through a pump into the liquid chamber. Gas escapes from the tank into a discharge line comprising a de-mister.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully