Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure
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United States of America Patent
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Nov 24, 1987
Grant Date -
N/A
app pub date -
Aug 2, 1985
filing date -
Aug 2, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process for manufacturing a mask for use in X-ray photolithography begins with a step of providing a glass disk (50) which is coated with a layer of boron nitride (52). The glass disk is about 1/4 of an inch thick and about 4.5 to 6 inches in diameter. A circular portion (50a) of the boron nitride layer on one side of the glass disk is removed thus exposing a circular portion of the glass disk. The exposed portion of the glass disk is then removed, leaving a glass ring coated with a boron nitride membrane on one side. A layer of polyimide (54) and a layer of x-ray opaque substance (58) is deposited on the boron nitride membrane. The x-ray opaque substance is then patterned, the resulting structure being a mask which is used in X-ray photolithography.
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