Plasma x-ray source

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United States of America Patent

PATENT NO 4715054
SERIAL NO

06795776

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Abstract

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A plasma X-ray source comprises inner and outer cylindrical electrodes disposed coaxially and with a certain distance with respect to each other, an electrical insulator disposed between end portions of the inner and outer cylindrical electrodes, and a discharge vessel disposed to envelop the inner and outer cylindrical electrodes. A pulse voltage is applied between the inner and outer cylindrical electrodes to produce plasma in the discharge vessel. An electrically conductive spherical shield is disposed to envelop a space where the plasma is pinched, and the spherical shield is maintained at a potential equal to that applied to the outer cylindrical electrode.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD A CORP OF JAPAN6 KANDA SURUGADAI 4-CHOME CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Kunio Hachioji, JP 59 873
Kato, Yasuo Zama, JP 175 1151
Kubota, Shigeo Kokubunji, JP 56 737
Murayama, Seiichi Kokubunji, JP 49 542
Watanabe, Yoshio Tokyo, JP 132 2084

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