Amorphous photovoltaic elements

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United States of America Patent

PATENT NO 4728370
SERIAL NO

06901286

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Abstract

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Disclosed are pin or nip type amorphous photovoltaic elements having the i-type layer comprised of an a-SiGe: H film, which are characterized in that an i-type amorphous silicon buffer layer is disposed between the layers of p-type and i-type and thus, the mutual diffusion of impurities and/or elements added to the i-type and/or the p-type layers through the p/i boundary is effectively restricted due to the presence of the buffer layer. As a result the formation of defects at the p/i boundary and the deterioration of the p-type layer are effectively prevented, and the properties important to these kinds of devices, such as Voc, Jsc, FF being substantially improved, thereby making it possible to provide photovoltaic elements such as solar batteries having a practically acceptable long life span and a high reliability.

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Patent Owner(s)

Patent OwnerAddress
NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION1310 OHMIYA-CHO SAIWAI-KU KAWASAKI-SHI KANAGAWA 212-0014

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Nobuhiko Hyogo, JP 39 507
Hitotsuyanagi, Hajime Hyogo, JP 13 120
Ishii, Masayuki Hyogo, JP 79 959

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