Process for forming a lithographic mask
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United States of America Patent
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Mar 15, 1988
Grant Date -
N/A
app pub date -
Apr 15, 1987
filing date -
Apr 15, 1987
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process is provided for forming a patterned layer of a polymeric material on a substrate for the lithographic processing thereof. A layer of polymeric material is formed on the substrate, embossed to form a pattern of peaks and valleys and dry etched to remove the residual polymeric material in the valleys, thereby exposing a portion of the substrate surface.
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