Method of applying a resist
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 19, 1988
Grant Date -
N/A
app pub date -
Jun 10, 1986
filing date -
Jun 12, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A photoresist process which comprises a process for spin-coating a substrate with a resist, a process for transferring a mask pattern onto the coated resist film followed by exposure, and a developing process for forming a pattern on the substrate after the pattern has been exposed. When the developed pattern of the resist pulsates with the increase or decrease of parameters in the process for applying resist, the value of the parameter is set to a value that corresponds to an extreme value of the pulsation.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully