Integrated ambient sensing devices and methods of manufacture
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United States of America Patent
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Apr 19, 1988
Grant Date -
N/A
app pub date -
Jan 19, 1984
filing date -
Jan 19, 1984
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An ambient sensing device is described especially suited to the sensing of a variety of ambient parameters. Photolithographic techniques are used to pattern a multiplicity of sensitive layers on a single monolithic substrate taking into account the wide range of plastic, gelatinous and ceramic materials to be patterned and the problems of their cross-contamination when in contact.
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