Multi-graded aperture masks
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United States of America Patent
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-
May 10, 1988
Issued Date -
N/A
app pub date -
Jun 13, 1986
filing date -
Jul 13, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An aperture mask having a grade side and a cone side with a plurality of openings of substantially the same size with the plurality of openings having a grade side partially etched region and a cone side partially etched region surrounding the plurality of openings, the grade side partially etched region surrounding the plurality of openings decreasing from the center of the mask to the periphery of the mask.
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Cited Art Landscape
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