Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide
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United States of America Patent
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May 17, 1988
Grant Date -
N/A
app pub date -
Apr 30, 1986
filing date -
Apr 30, 1986
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A composition of matter is set forth which is useful for removing a photoresist material from a substrate. The composition comprises 10 to 90% by weight of a 2-pyrrolidinone compound of the formula ##STR1## 10 to 30% by weight of a diethylene glycol monalkyl ether of the formula HOCH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 OR.sub.2 1 to 10% by weight of a polyglycol having a molecular weight from about 200 to about 600, and 0.5 to 4% of a quaternary ammonium hydroxide of the formula N.sup.+ R.sub.3 R.sub.4 R.sub.5 R.sub.6 OH.sup.- wherein R.sub.1 is hydrogen, alkyl of 1 to 3 carbon atoms or hydroxyalkyl of 1 to 3 carbon atoms, R.sub.2, R.sub.3 and R.sub.4 are the same or different alkyl groups of 1 to 4 carbon atoms, R.sub.5 is an alkyl group of 1 to 18 carbon atoms, and R.sub.6 is an alkyl group of 1 to 18 carbon atoms, phenyl, alkylphenyl wherein the alkyl is of 1 to 18 carbon atoms, benzyl, or alkylbenzyl wherein the alkyl is of 1 to 18 carbon atoms.
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