Method for stitching along the contours of patterns deposited on two-dimensional elastic fabrics and apparatus to implement the method

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United States of America Patent

PATENT NO 4748920
SERIAL NO

06915615

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Difficulties are met with when contour-stitching patterns deposited on two-dimensional elastic fabrics because the originally printed or woven-in pattern is significantly warped already during printing or weaving and then during the clamping of the fabric in a clamping frame because of the fabric's elasticity. To make possible automatic contour-stitching, the invention proposes to feed the theroretical dimensional data of the pattern contours together with at least a few prominent sites into a memory of an electronic control for the automatic stitching machine and the actual dimensional data of at least those prominent sites are inputted by means of a computer in such a manner that the theoretical dimensional data are corrected relative to the actual positions of the pattern contours.

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Patent Owner(s)

Patent OwnerAddress
NAHMASCHINENFABRIK EMIL STUTZNACKER GMBH & CO KG A CORP OF GERMANYMAX-PLANCK-STRASSE 3 D-5000 KOLN 40

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Stutznacker, Klaus Frechen-Konigsdorf, DE 16 130

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