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Abstract

An optical emission microscopy system with a macro optic system having a high numerical aperture for obtaining global views of an integrated circuit Device Under Test (DUT). The DUT is subjected to illumination and stimulation conditions, and images are obtained to form a 'global difference' image in which defects, wherever located in the chip, can be discerned by the system operator. The operator can select apparent 'defect bright spots' to be further inspected, and zoom in with the higher magnification micro optics system to repeat the image formation steps. 'Difference images' are processed to further eliminate noise spots using an improved two-stage filtering operation. The system may be operated under manual or automatic control, and may be interfaced to various data input, storage, and output devices as desired.

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First Claim