Method and apparatus for producing a relief pattern with a microscopic structure, in particular having an optical diffraction effect
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United States of America Patent
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Aug 2, 1988
Issued Date -
N/A
app pub date -
Jan 29, 1987
filing date -
Jul 6, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for embossing a pattern having a microscopic relief structure, such as, for example, an optical diffraction grating, onto a layer of thermoplastic material is disclosed. A small circular region of a flexible embossing die is pressed against the thermoplastic layer by means of a punch. A fraction of the corresponding small circular region of the thermoplastic layer is then heated from the rear by a beam of radiant energy. The process may be repeated at all points on the thermoplastic layer where the pattern is desired.
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